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Foshan digital printing glass customization, digital printing of what is magnetron sputtering method

Release time:

Sep 25,2024

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Magnetron sputtering (MagnetronSputtering) is a coating technology that uses a magnetic field to control the movement of electrons to accelerate the sputtering of target materials. The following is a detailed explanation of the magnetron sputtering method:

Definition and Principle of 1.

Definition: Magnetron sputtering method is in a high vacuum environment, through the application of voltage to make argon ionization, and the use of magnetic field to control the movement of electrons, so that the electron in the vicinity of the target surface to do spiral motion, thereby increasing the probability of electron impact argon ion. These ions are accelerated under the action of an electric field to bombard the surface of the target, so that the target atoms or molecules are sputtered out and deposited on the substrate to form a thin film.

Principle: In the high vacuum coating chamber, a voltage is applied between the cathode (target) and the anode (coating chamber wall) to generate a magnetron-type abnormal glow discharge. The electrons collide with argon atoms in the process of flying to the substrate, ionizing them to produce Ar positive ions and new electrons.

Ar ions are accelerated to bombard the surface of the target under the action of the electric field, and the target atoms or molecules are sputtered. At the same time, the generated secondary electrons produce E×B drift under the action of electric field and magnetic field, are bound in the plasma region near the target surface, and continue to ionize more Ar ions to bombard the target, so as to achieve a high deposition rate.

2. Type

Magnetron sputtering includes many types, such as reactive magnetron sputtering, AC magnetron sputtering and unbalanced magnetron sputtering, etc:

Reactive magnetron sputtering: In the sputtering process, the target material reacts with a reactive gas (such as oxygen, nitrogen, etc.) to generate a compound film. This method can prepare high purity compound thin films, and control the composition and characteristics of the film by adjusting the reaction parameters.

AC magnetron sputtering: AC power supply is used instead of DC power supply to solve the abnormal discharge phenomenon on the target surface. During AC sputtering, the voltage of the target to the vacuum chamber wall is a periodic AC pulse voltage, which improves the stability and uniformity of sputtering.

Unbalanced magnetron sputtering: The plasma at the cathode target surface is directed to the vicinity of the substrate by an additional magnetic field, so that the substrate is immersed in the plasma. This method not only improves the sputtering rate, but also enhances the film quality.

3. features

The bonding force between the coating layer and the substrate is strong: because the sputtered atoms or molecules have high energy and interact strongly with the surface of the substrate, the bonding force between the formed film and the substrate is very strong.

The coating layer is dense and uniform: the micro-morphology of the film surface prepared by magnetron sputtering is fine and fine, and very uniform.

The operation is easy to control: as long as the sputtering conditions such as working pressure and electric power are relatively stable, a relatively stable deposition rate can be obtained.

High deposition rate: especially suitable for depositing high melting point metal and oxide films.

Substrate low temperature: compared to other coating methods, magnetron sputtering heating of the substrate less.

Process environmental protection: no environmental pollution, high production efficiency.

4. application

Magnetron sputtering is widely used in many fields, such as the deposition of metal electrode films and dielectric films in the field of microelectronics, the preparation of optical films, the production of surface functional films and super-hard films in modern mechanical processing industries.

In addition, it also plays an important role in the research of high temperature superconducting films, ferroelectric films, giant magnetoresistance films, thin film luminescent materials, solar cells and memory alloy films.

In summary, magnetron sputtering is an efficient, environmentally friendly and easily controlled thin film deposition technology, which has a wide range of applications in modern industry and scientific research.

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